六方氮化硼晶体20片装hBN(Hexagonal Boron Nitride)-Crystal

　　六方氮化硼晶体（20片装） hBN(Hexagonal Boron Nitride)-Crystal

　　晶体尺寸：~1mm

　　电学性能：绝缘体/半导体

　　晶体结构：六边形

　　晶胞参数：a = b = 0.2502 nm, c = 0.6617 nm, α = β = 90°, γ = 120°

　　晶体类型：合成

　　晶体纯度：A级

　　X-ray diffraction on a hexagonal boron nitride single crystal aligned along the (001) plane. XRD was performed at room temperature using a D8 Venture Bruker. The 4 XRD peaks correspond, from left to right, to (00l) with l = 1, 2, 3

　　Raman spectrum of a single crystal hexagonal boron nitride (h-BN). Measurement was performed with a 785nm Raman system at room temperature.

　　Device at left side: Fabrication of a high mobiltity bilayer graphene. This field effect transistor is fabricated using the polymer 2D_CL_PC ( click here ). The device is composed out of four 2D layers. The bilayer graphene is encapsulated between two hexagonal boron nitride crystals (h-BN). The fourth layer is a thin layer of graphite (HOPG) which is used as a backgate. Scale bar is 20μm. Device at right side: This device is similar to the one at the left side, here we added on the top hexagonal boron nitride layer a gold electrode in order to apply a top gate voltage to the hBN encapsulated bilayer graphene. Scale bar is 20μm